大幅提升曝光品質和效率

為曝光機產業帶來巨大的競爭優勢和市場機會

技術內容重點

  • 高精度、支持365~405波長無光照式紫外線(UV)曝光機光學系統
  • 提供高效、環保、客製化的解決方案

應用範圍

精密封裝、電路板佈線、電路板防焊

 
MG1035
MG1036
MG1034(Non-UV)
MG1024/MG1037(UV)
MG1033
規格 MG1035 MG1036 MG1034
(Non-UV)
MG1024/
MG1037(UV)
MG1033
Magnification 0.8X 1.5X 2.4X 2.4X 1.68X
Pixel Size (Image/Object) 8.64/10.8 25.925/10.8 25.925/10.8 25.925/10.8 22.975/13.68
LED wavelength 365 / 405 nm 405nm 405nm 365/385/405nm 365/385/405nm
Numerical Aperture, object space(DMD side) 0.08 0.14 0.18 0.18 0.2
Magnification 0.8 ± 40x10^-6 1.5 ± 0.005% 2.4 ± 0.005% 2.4 ± 0.005% 1.68 ± 0.005%
Distortion <0.025% <0.025% <0.025% <0.025% <0.025%
Field Curvature <13 um (Design value) <20 um (Design value) <20 um (Design value) <20 um (Design value) <20 um (Design value)
Transimission >80% @405nm >80% >80% >80% >82%(@405nm)
Housing envelope <= 82 mm <= 82 mm <= 82 mm <= 82 mm 3.230” +.003/-.000
(82.042 +0.076/-0 mm) maximum diameter
Front working distance (mm from object plane-DMD) >65mm 65 +0.1/0 (>65 mm) 65 +0.1/0 (>65 mm) 65 +0.1/0 (>65 mm) >65mm
Back working distance (mm from image plane) >50mm >49 mm >49 mm >49 mm >50mm
Total track length (object to image) <500mm <500mm <500mm <500mm <500mm
TIR Prism Thickness 42.5mm 42.5mm 42.5mm 42.5mm 25 mm
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